久久精品一区二区三区,中文字幕日本精品人妻

Chip Fabrication

芯片制造.jpg

In the chip manufacturing industry, ultrapure water is known as the "blood" of the industry. It is used throughout all core chip manufacturing processes, including silicon wafer cleaning, photoresist coating and development, wet etching, and chemical mechanical polishing (CMP).

These processes place extremely stringent demands on water quality; even the slightest impurity can cause chip fluid failure.

Among many water quality parameters, total organic carbon (TOC) is a key indicator of the degree of organic contamination in ultrapure water. The presence of TOC, even at extremely low levels of ppb (parts per billion) or even ppt (parts per trillion), can seriously impact the quality of delicate semiconductor devices.

Vacuum ultraviolet (VUV) technology, an advanced, chemical-free method for TOC degradation, uses high-energy ultraviolet light directly on water or organic matter in it, generating strong oxidizing free radicals that break down the organic matter into harmless small molecules.

Low-pressure mercury lamps are the primary VUV light source used in current industrial applications, with 185nm VUV light being the primary contributor to TOC degradation.

VUV light (185nm) can directly photolyze water molecules, generating hydroxyl radicals (·OH) in situ. ·OH is a highly reactive species with strong oxidizing power, capable of non-selectively oxidizing and degrading most organic pollutants in water. This process, when used in pure VUV photolysis, eliminates the need for additional chemical reagents, thus avoiding the risk of secondary contamination. This is particularly important for the preparation of ultrapure water.

TOC紫外.png

The target for controlling TOC in ultrapure water is typically less than 1 ppb (ug/L).

Advanced processes even require limits below 0.5 ppb or even ppt (ng/L).

· Position in the UPW system:

典型芯片超純水工藝圖.png

Typical ultrapure water process flow chart

Advanced Treatment of Small-Molecular Organic Compounds

The UV/H?O? Advanced Oxidation Process (UV/H?O? AOP) is a highly efficient, non-selective advanced treatment technology for the removal of residual small-molecule organic compounds from reverse osmosis (RO) effluent.

?OH Radical Non-Selective Attack

The core of the UV/H?O? process is that under 185 nm or 254 nm UV light, H?O? undergoes homolytic cleavage to produce hydroxyl radicals (?OH). These radicals react with the C–H, C=C, and C≡C bonds of small-molecule organic compounds, continuously oxidizing small-molecule organic compounds (<350 Da, such as methanol, urea, oxalic acid, PPCPs, and EDCs) that are not retained by RO, ultimately mineralizing them into CO? and H?O.

Previous
Pharmaceutical Purified water

Next
Oilfield reinjection water

Related Products

EX-UPW-TOC UV TOC System

The EX-UPW-TOC product series is an advanced and reliable system for total organic carbon (TOC) degradation in ultrapure water (UPW) production. Through enhanced 185nm transmittance, real-time UV intensity monitoring, and local/remote intelligent control, it achieves efficient, safe, and controllable TOC degradation. This equipment can reduce TOC levels in ultrapure water to below 1 ppb during the UPW production process.

MOS Ceramic Plate CD Ozone Generator

MOS-W water-cooled ozone generator adopts microfluidic water cooling technology and digital power control technology. Adaptive frequency control technology enables the ozone discharge chamber to work at the best efficiency, ensuring the output concentration and output of ozone.

CLEAR Medium pressure UV Disinfection System

The ONYX-Clear-SY in-line medium-pressure UV sterilizer uses medium-pressure UV lamps for physical sterilization, without the addition of any chemicals or secondary pollution. It offers safe operation, ease of use, and reduced operating costs and maintenance.

The treated water does not affect taste or flavor. It complies with water standards such as the Food Safety Law of the People's Republic of China, the Sanitary Standard for Drinking Water (GB 5749), the Drinking Water Quality Standard (CJ94-2005), the National Food Safety Standard for Drinking Natural Mineral Water (GB 8537-2018), and the Packaged Drinking Water Standard (DGB19298-2014).

UV Photolysis

UV photolysis generally refers to the use of ultraviolet (UV) light to decompose substances, particularly pollutants.

Specific wavelengths of UV light (usually short-wavelength UV-C, such as 254 nm) can directly break the molecular bonds of certain substances (especially organic pollutants), causing a cracking reaction that breaks them down into smaller molecules, free radicals, or ultimately mineralizes them into CO? and H?O. This is known as direct photolysis. It is primarily used for TOC removal in ultrapure water, residual chlorine removal and disinfection prior to RO membranes for purified water, and the decomposition and disinfection of ammonium chloride in swimming pools and water features.

亚洲av伊人久久久,av一区二区回娘家,欧美日韩黄色激情,日韩美女不雅视频,成年人在线看视频,伊人成人情人综合网,成年人短视频在线,av天堂手机在线观看,网友自拍视频在线国产

Municipal Municipal Wastewater Municipal water supply Recycled Water Reuse Township water supply and drainage Industrial Park New pollutant control Water ecological restoration project

Industry Pretreatment of industrial high-difficulty wastewater Pesticide Industry API pharmaceuticals Chemical waste salt purification Food & Beverage Industry Pharmaceutical Purified water Chip Fabrication Oilfield reinjection water Industrial zero emissions

Commercial Secondary water supply Pool & Aquarium High-quality drinking water POE/POU Aquaculture Cooling Circulating water Laboratory applications

UV-AOPs Wastewater Biodegradability Pretreatment of highly toxic industrial wastewater Chemical active agents Cyanide Organic Complexes

Craftsmanship UV disinfection UV photolysis UV Advanced Oxidation Reverse Osmosis Alternative to pasteurization UV photochemical reaction Ozone oxidation

Resource Recycling waste plastics Construction waste Renovation waste

Municipal WSH UV Disinfection System WTV UV Disinfection Vertical System ZL UV Disinfection System Clear Medium Pressure UV Disinfection System MOL Ceramic Plate CD Ozone Generator UV-AOP Advanced Oxidation System D.FITE Cloth Filter

Industry ZL UV Disinfection System Clear Medium Pressure UV Disinfection System UV-AOP Advanced Oxidation Extrem Medium Pressure UV Disinfection System EX-U UV Sterilizer EX-UPW-TOC UV TOC System MOM Ceramic Plate CD Ozone Generator MOS Ceramic Plate CD Ozone Generator UV-Fenton UV-Oxidation

Commercial EX-L UV Sterilizer EX-U UV Sterilizer ZL UV Disinfection System CLEAR Medium pressure UV Disinfection System OneUV UV Sterilizer Extrem Medium pressure UV Disinfection System UV-AOP Advanced Oxidation MOS Ceramic Plate CD Ozone Generator COG Ceramic Plate CD Ozone Generator

Photochemistry UV-Fenton Medium-pressure UV-Oxidation UV Photolysis Pasteurization UV Alternatives UV Photocatalysis Low Pressure UV-Oxidation

Resource Recycling AI Optical Sorter Al high-speed sorting robot AI heavy-duty sorting robot

Others SATBR Integrated Wastewater Treatment System D.FITE Cloth Filter Modular Wastewater Treatment System ModuOzone Ceramic Plate CD Ozone Generator

After-Sales Services Spare parts replacement Product Repair System Support Renovation Regular maintenance Software Upgrade

Technical Support Process Support Product Training Research & Development Small Test Pilotscale experiment Online dose monitoring UV dose design

Channel Services Municipal Industry Business OEM

Spare parts Low Pressure lamps Low Pressure Amalgam Lamps Medium Pressure Mercury Lamp VUV Low-pressure Mercury Lamp（185nm） Quartz sleeve Ballasts UV Intensity Sensor UV transmittance tester Sealing accessories Other Spare parts replacement

Industry Applications

Related Products

About Us

Applications

Products

News

Services

Resources

Contact us